Title: Materials and post-processes for multi-photon lithography
Speaker: Dimitra Ladika (VULRC)
Date: Wednesday, 29 April 2026, 16:00-17:00 Central European Summer Time (CEST)

Multi-photon lithography (MPL) enables the fabrication of true 3D micro- and nanostructures without the need for masks or complex tooling, directly from computer-aided designs. Owing to these unique capabilities, MPL has emerged as a powerful manufacturing technique across a wide range of disciplines. The ongoing growth of MPL is closely linked to advances in material design and post-processing strategies.

In particular, the composition of MPL photoresists, including the presence or absence of photoinitiators, plays a critical role in defining fabrication thresholds, resolution, and the optical properties of the resulting structures. While photoinitiators can enhance polymerization efficiency, they may also introduce fluorescence and coloration, limiting their use in certain applications. In contrast, photoinitiator-free and doped systems offer alternative pathways toward improved optical performance. The interaction of these materials with femtosecond laser irradiation across multiple wavelengths provides additional flexibility for controlling polymerization and tailoring spectral response.

Additionally, post-processing approaches, such as calcination and surface coatings, further extend the capabilities of MPL by enabling the fabrication of fully inorganic and spectrally adaptable architectures. These strategies enhance the functionality and stability of the fabricated 3D structures without fundamentally altering the initial material platform.

Overall, these developments demonstrate the potential of material-driven approaches in MPL for applications in photonics and optoelectronics.